JPS632099B2 - - Google Patents

Info

Publication number
JPS632099B2
JPS632099B2 JP55112255A JP11225580A JPS632099B2 JP S632099 B2 JPS632099 B2 JP S632099B2 JP 55112255 A JP55112255 A JP 55112255A JP 11225580 A JP11225580 A JP 11225580A JP S632099 B2 JPS632099 B2 JP S632099B2
Authority
JP
Japan
Prior art keywords
composition according
dye
present
compound
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55112255A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5635134A (en
Inventor
Deizauaa Rorufu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5635134A publication Critical patent/JPS5635134A/ja
Publication of JPS632099B2 publication Critical patent/JPS632099B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732Leuco dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
JP11225580A 1979-08-14 1980-08-14 Image forming composition Granted JPS5635134A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/066,373 US4252887A (en) 1979-08-14 1979-08-14 Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators

Publications (2)

Publication Number Publication Date
JPS5635134A JPS5635134A (en) 1981-04-07
JPS632099B2 true JPS632099B2 (en]) 1988-01-16

Family

ID=22069099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11225580A Granted JPS5635134A (en) 1979-08-14 1980-08-14 Image forming composition

Country Status (5)

Country Link
US (1) US4252887A (en])
EP (1) EP0024629B1 (en])
JP (1) JPS5635134A (en])
CA (1) CA1137348A (en])
DE (1) DE3066051D1 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779536A1 (en) 1995-12-04 1997-06-18 Konica Corporation Light-and heat-sensitive recording material and recording method by use thereof

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US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
EP0065326B1 (en) * 1981-05-15 1985-06-19 Agfa-Gevaert N.V. A photosensitive recording material and photographic processes wherein said material is used
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPS59140447A (ja) * 1983-02-01 1984-08-11 Hodogaya Chem Co Ltd 感光性組成物
US4517215A (en) * 1983-05-26 1985-05-14 Nestec, S.A. Preparation of vegetable pastas
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
EP0243934A3 (en) * 1986-05-01 1990-04-18 E.I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
JPS6355539A (ja) * 1986-05-30 1988-03-10 Toyobo Co Ltd 画像形成材料および画像形成方法
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
US4818660A (en) * 1987-11-04 1989-04-04 E. I. Du Pont De Nemours And Company Photohardenable electrostatic master having improved backtransfer and charge decay
JPH02101065A (ja) * 1988-10-06 1990-04-12 Tanabe Seiyaku Co Ltd イミダゾリン誘導体及びその製法
US5922751A (en) * 1994-06-24 1999-07-13 Euro-Celtique, S.A. Aryl pyrazole compound for inhibiting phosphodiesterase IV and methods of using same
JP3400586B2 (ja) * 1995-02-10 2003-04-28 富士写真フイルム株式会社 光重合性組成物
JP3564836B2 (ja) * 1995-11-22 2004-09-15 Jsr株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
MY120763A (en) 1997-09-19 2005-11-30 Hitachi Chemical Co Ltd Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer
US6627309B2 (en) * 2001-05-08 2003-09-30 3M Innovative Properties Company Adhesive detackification
US7462443B2 (en) * 2003-09-05 2008-12-09 Hewlett-Packard Development Company, L.P. Leuco dye-containing coating compositions
WO2005029187A1 (en) 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
US20060093958A1 (en) * 2004-10-28 2006-05-04 Vladek Kasperchik Color forming compositions and associated methods
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
JP4547308B2 (ja) * 2005-06-30 2010-09-22 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
DE602005013398D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788443B1 (en) 2005-11-18 2014-07-02 Agfa Graphics N.V. Method of making a lithographic printing plate
EP1788430B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
EP1788434B2 (en) 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
DE602005026136D1 (de) 2005-11-18 2011-03-10 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
DE602005022594D1 (de) 2005-11-18 2010-09-09 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
ES2321205T3 (es) 2005-11-18 2009-06-03 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
ATE422066T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ATE430330T1 (de) 2005-11-21 2009-05-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788449A1 (en) 2005-11-21 2007-05-23 Agfa Graphics N.V. Method for making a lithographic printing plate
DK1788435T3 (da) 2005-11-21 2013-06-17 Agfa Graphics Nv Fremgangsmåde til fremstilling af en litografisk trykplade
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8283100B2 (en) * 2006-05-16 2012-10-09 Hewlett-Packard Development Company, L.P. Color forming compositions and associated methods
DE602006009919D1 (de) 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
CN101535900B (zh) * 2006-08-30 2013-09-04 斯蒂茨丁荷兰聚合物学会 一种制备聚合浮雕结构的方法
BRPI0811197B1 (pt) 2007-05-25 2019-04-02 Agfa Nv Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
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JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
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JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
EP2320274A4 (en) 2008-08-22 2011-12-14 Fujifilm Corp METHOD FOR MANUFACTURING A LITHOGRAPHIC PRINTING PLATE
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
EP2340463B1 (en) 2008-10-15 2014-12-17 International Paper Company Imaging particulate composition and imaging process using dual wavelength light
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JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
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JP5629628B2 (ja) 2010-03-31 2014-11-26 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
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EP3001249B1 (en) 2011-02-28 2019-12-25 FUJIFILM Corporation Lithographic printing plate precursors and processes for preparing lithographic printing plates
JP5186574B2 (ja) 2011-02-28 2013-04-17 富士フイルム株式会社 平版印刷版原版及びその製版方法
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JP5743783B2 (ja) 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
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BR112014007143A2 (pt) 2011-09-26 2017-06-13 Fujifilm Corp processo para fabricar chapa de impressão litográfica
JP5732012B2 (ja) 2011-09-26 2015-06-10 富士フイルム株式会社 平版印刷版の製版方法
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CN104115069B (zh) 2012-02-20 2018-11-02 富士胶片株式会社 制版处理废液的浓缩方法及再循环方法
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NL296772A (en]) * 1962-03-21
US3445234A (en) * 1962-10-31 1969-05-20 Du Pont Leuco dye/hexaarylbiimidazole imageforming composition
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3390994A (en) * 1966-02-17 1968-07-02 Du Pont Photodeactivatable light-sensitive color-forming composition
US3615481A (en) * 1969-05-19 1971-10-26 Du Pont Leuco dye/hexaarylbiimidazole thermally activated imaging process
US3661461A (en) * 1969-11-26 1972-05-09 Du Pont Co-irradiation system for producing positive images
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779536A1 (en) 1995-12-04 1997-06-18 Konica Corporation Light-and heat-sensitive recording material and recording method by use thereof

Also Published As

Publication number Publication date
DE3066051D1 (en) 1984-02-09
JPS5635134A (en) 1981-04-07
EP0024629A2 (en) 1981-03-11
EP0024629B1 (en) 1984-01-04
EP0024629A3 (en) 1982-02-03
US4252887A (en) 1981-02-24
CA1137348A (en) 1982-12-14

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